Cluster ripening and transient enhanced diffusion in silicon

  1. Cowern, N.E.B.
  2. Mannino, G.
  3. Stolk, P.A.
  4. Roozeboom, F.
  5. Huizing, H.G.A.
  6. Van Berkum, J.G.M.
  7. Cristiano, F.
  8. Claverie, A.
  9. Jaraíz, M.
Journal:
Materials Science in Semiconductor Processing

ISSN: 1369-8001

Year of publication: 1999

Volume: 2

Issue: 4

Pages: 369-376

Type: Article

DOI: 10.1016/S1369-8001(99)00039-6 GOOGLE SCHOLAR
Data source: Scopus