Cluster ripening and transient enhanced diffusion in silicon

  1. Cowern, N.E.B.
  2. Mannino, G.
  3. Stolk, P.A.
  4. Roozeboom, F.
  5. Huizing, H.G.A.
  6. Van Berkum, J.G.M.
  7. Cristiano, F.
  8. Claverie, A.
  9. Jaraíz, M.
Revue:
Materials Science in Semiconductor Processing

ISSN: 1369-8001

Année de publication: 1999

Volumen: 2

Número: 4

Pages: 369-376

Type: Article

DOI: 10.1016/S1369-8001(99)00039-6 GOOGLE SCHOLAR
La source de données: Scopus