Atomistic analysis of the annealing behavior of amorphous regions in silicon

  1. López, P.
  2. Pelaz, L.
  3. Marqús, L.A.
  4. Santos, I.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2007

Volume: 101

Issue: 9

Type: Conference paper

DOI: 10.1063/1.2729468 GOOGLE SCHOLAR
Data source: Scopus