Tailored deposition by LPCVD of non-stoichiometric Si oxides and their application in the formation of Si nanocrystals embedded in SiO2 by thermal annealing

1. Morana, B.
2. De Sande, J.C.G.
3. Rodríguez, A.
4. Sangrador, J.
5. Rodríguez, T.
6. Avella, M.
7. Prieto, Á.C.
8. Jiménez, J.