Atomistic modeling of impurity ion implantation in ultra-thin-body Si devices

  1. Pelaz, L.
  2. Duffy, R.
  3. Aboy, M.
  4. Marques, L.
  5. Lopez, P.
  6. Santos, I.
  7. Pawlak, B.J.
  8. Van Dal, M.J.H.
  9. Duriez, B.
  10. Merelle, T.
  11. Doornbos, G.
  12. Collaert, N.
  13. Witters, L.
  14. Rooyackers, R.
  15. Vandervorst, W.
  16. Jurczak, M.
  17. Kaiser, M.
  18. Weemaes, R.G.R.
  19. Van Berkum, J.G.M.
  20. Breimer, P.
  21. Lander, R.J.P.
Actes de conférence:
Technical Digest - International Electron Devices Meeting, IEDM

ISSN: 0163-1918

ISBN: 9781424423781

Année de publication: 2008

Type: Communication dans un congrès

DOI: 10.1109/IEDM.2008.4796744 GOOGLE SCHOLAR