Comprehensive model of damage accumulation in silicon

  1. Mok, K.R.C.
  2. Benistant, F.
  3. Jaraiz, M.
  4. Rubio, J.E.
  5. Castrillo, P.
  6. Pinacho, R.
  7. Srinivasan, M.P.
Journal:
Journal of Applied Physics

ISSN: 0021-8979

Year of publication: 2008

Volume: 103

Issue: 1

Type: Article

DOI: 10.1063/1.2829815 GOOGLE SCHOLAR
Data source: Scopus