Kinetic Monte Carlo simulations of boron activation in implanted Si under laser thermal annealing

  1. Fisicaro, G.
  2. Pelaz, L.
  3. Aboy, M.
  4. Lopez, P.
  5. Italia, M.
  6. Huet, K.
  7. Cristiano, F.
  8. Essa, Z.
  9. Yang, Q.
  10. Bedel-Pereira, E.
  11. Quillec, M.
  12. La Magna, A.
Revue:
Applied Physics Express

ISSN: 1882-0778 1882-0786

Année de publication: 2014

Volumen: 7

Número: 2

Type: Article

DOI: 10.7567/APEX.7.021301 GOOGLE SCHOLAR lock_openUVADOC editor