Atomistic front-end process modelling: A powerful tool for deep-submicron device fabrication

  1. Jaraiz, M
  2. Castrillo, P
  3. Pinacho, R
  4. Martin-Bragado, I
  5. Barbolla, J
Book:
SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES 2001
  1. Tsoukalas, D (coord.)
  2. Tsamis, C (coord.)

ISBN: 3-211-83708-6

Year of publication: 2001

Pages: 10-17

Congress: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 01)

Type: Conference paper

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Data source: WoS