Atomistic front-end process modelling: A powerful tool for deep-submicron device fabrication
- Jaraiz, M
- Castrillo, P
- Pinacho, R
- Martin-Bragado, I
- Barbolla, J
- Tsoukalas, D (coord.)
- Tsamis, C (coord.)
ISBN: 3-211-83708-6
Année de publication: 2001
Pages: 10-17
Congreso: International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 01)
Type: Communication dans un congrès