Publicaciones en las que colabora con Robert B. Simonton (2)

1998

  1. Damage, defects and diffusion from ultra-low energy (0-5 keV) ion implantation of silicon

    Materials Science in Semiconductor Processing, Vol. 1, Núm. 1, pp. 17-25

1997

  1. Boron-Enhanced-Diffusion of boron: The limiting factor for ultra-shallow junctions

    Technical Digest - International Electron Devices Meeting, IEDM