CENTER OF INNOVATION IN CHEMISTRY AND ADVANCED MATERIALS
Institute
Nokia Foundation
Espoo, FinlandiaPublications in collaboration with researchers from Nokia Foundation (2)
1999
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Atomistic simulations of ion implantation and diffusion
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
1997
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Atomistic model of transient enhanced diffusion and clustering of boron in silicon
Materials Research Society Symposium - Proceedings