ETS INGENIEROS TELECOMUNICACION
Center


Fraunhofer Institute for Integrated Systems and Device Technology
Erlangen, AlemaniaPublications in collaboration with researchers from Fraunhofer Institute for Integrated Systems and Device Technology (2)
2013
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Dopant dynamics and defects evolution in implanted silicon under laser irradiations: A coupled continuum and kinetic Monte Carlo approach
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
2008
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Angular distributions of sputtered atoms from semiconductor targets at grazing ion beam incidence angles
AIP Conference Proceedings