Full composition range silicon oxynitride films deposited by ECR-PECVD at room temperature

  1. Del Prado, A.
  2. Mártil, I.
  3. Fernández, M.
  4. González-Díaz, G.
Revue:
Thin Solid Films

ISSN: 0040-6090

Année de publication: 1999

Volumen: 343-344

Número: 1-2

Pages: 437-440

Type: Article

DOI: 10.1016/S0040-6090(98)01701-5 GOOGLE SCHOLAR
La source de données: Scopus