On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO 2/Si fabricated by ECR-CVD

  1. Dueñas, S.
  2. H.castán, null
  3. García, H.
  4. Barbolla, J.
  5. San Andrés, E.
  6. Mártil, I.
  7. González-Díaz, G.
Aldizkaria:
Microelectronics Reliability

ISSN: 0026-2714

Argitalpen urtea: 2005

Alea: 45

Zenbakia: 5-6

Orrialdeak: 978-981

Mota: Biltzar ekarpena

DOI: 10.1016/J.MICROREL.2004.11.012 GOOGLE SCHOLAR
Datuen iturria: Scopus