On the influence of substrate cleaning method and rapid thermal annealing conditions on the electrical characteristics of Al/SiNx/SiO 2/Si fabricated by ECR-CVD

  1. Dueñas, S.
  2. H.castán, null
  3. García, H.
  4. Barbolla, J.
  5. San Andrés, E.
  6. Mártil, I.
  7. González-Díaz, G.
Revue:
Microelectronics Reliability

ISSN: 0026-2714

Année de publication: 2005

Volumen: 45

Número: 5-6

Pages: 978-981

Type: Communication dans un congrès

DOI: 10.1016/J.MICROREL.2004.11.012 GOOGLE SCHOLAR
La source de données: Scopus