Raman-scattering assessment of Si+-implantation damage in InP

  1. Cuscó, R.
  2. Talamàs, G.
  3. Artús, L.
  4. Martin, J.M.
  5. González-Díaz, G.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 1996

Volumen: 79

Número: 8

Pages: 3927-3929

Type: Article

DOI: 10.1063/1.361819 GOOGLE SCHOLAR