Comprehensive modeling of ion-implant amorphization in silicon

  1. Mok, K.R.C.
  2. Jaraiz, M.
  3. Martin-Bragado, I.
  4. Rubio, J.E.
  5. Castrillo, P.
  6. Pinacho, R.
  7. Srinivasan, M.P.
  8. Benistant, F.
Revue:
Materials Science and Engineering B: Solid-State Materials for Advanced Technology

ISSN: 0921-5107

Année de publication: 2005

Volumen: 124-125

Número: SUPPL.

Pages: 383-385

Type: Communication dans un congrès

DOI: 10.1016/J.MSEB.2005.08.026 GOOGLE SCHOLAR

Objectifs de Développement Durable