Atomistic modeling of defect diffusion and interdiffusion in SiGe heterostructures

  1. Castrillo, P.
  2. Jaraiz, M.
  3. Pinacho, R.
  4. Rubio, J.E.
Journal:
Thin Solid Films

ISSN: 0040-6090

Year of publication: 2010

Volume: 518

Issue: 9

Pages: 2448-2453

Type: Article

DOI: 10.1016/J.TSF.2009.10.113 GOOGLE SCHOLAR
Data source: Scopus