2 MeV electron irradiation effects on bulk and interface of atomic layer deposited high-k gate dielectrics on silicon

  1. García, H.
  2. Castán, H.
  3. Dueñas, S.
  4. Bailón, L.
  5. Campabadal, F.
  6. Rafí, J.M.
  7. Zabala, M.
  8. Beldarrain, O.
  9. Ohyama, H.
  10. Takakura, K.
  11. Tsunoda, I.
Journal:
Thin Solid Films

ISSN: 0040-6090

Year of publication: 2013

Volume: 534

Pages: 482-487

Type: Article

DOI: 10.1016/J.TSF.2013.02.004 GOOGLE SCHOLAR