2 MeV electron irradiation effects on bulk and interface of atomic layer deposited high-k gate dielectrics on silicon
- García, H.
- Castán, H.
- Dueñas, S.
- Bailón, L.
- Campabadal, F.
- Rafí, J.M.
- Zabala, M.
- Beldarrain, O.
- Ohyama, H.
- Takakura, K.
- Tsunoda, I.
Journal:
Thin Solid Films
ISSN: 0040-6090
Year of publication: 2013
Volume: 534
Pages: 482-487
Type: Article