2 MeV electron irradiation effects on bulk and interface of atomic layer deposited high-k gate dielectrics on silicon

  1. García, H.
  2. Castán, H.
  3. Dueñas, S.
  4. Bailón, L.
  5. Campabadal, F.
  6. Rafí, J.M.
  7. Zabala, M.
  8. Beldarrain, O.
  9. Ohyama, H.
  10. Takakura, K.
  11. Tsunoda, I.
Aldizkaria:
Thin Solid Films

ISSN: 0040-6090

Argitalpen urtea: 2013

Alea: 534

Orrialdeak: 482-487

Mota: Artikulua

DOI: 10.1016/J.TSF.2013.02.004 GOOGLE SCHOLAR