Comparative Equilibrium Analysis of Metalorganic Chemical Vapor Deposition (MOCVD) GaAs Growth Using Trimethylgallium (TMGa) with Arsine or Trimethylarsine (TMAs)

Abril, E.J.
Aguilar, M.
Alonso, A.
Lopez, M.

Journal:

Japanese Journal of Applied Physics

ISSN: 1347-4065, 0021-4922

Year of publication: 1992

Volume: 31

Issue: 6 R

Pages: 1721-1725

Type: Article

DOI: 10.1143/JJAP.31.1721 GOOGLE SCHOLAR

Data source: Scopus