Electricidad y Electrónica
Departamento
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Nokia Foundation
Espoo, FinlandiaPublicaciones en colaboración con investigadores/as de Nokia Foundation (6)
2000
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Dominant iron gettering mechanism in p/p+ silicon wafers
Applied Physics Letters, Vol. 77, Núm. 2, pp. 241-243
1999
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Atomistic simulations of ion implantation and diffusion
International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
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Boron pileup and clustering in silicon-on-insulator films
Applied Physics Letters, Vol. 75, Núm. 8, pp. 1083-1085
1997
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Atomistic model of transient enhanced diffusion and clustering of boron in silicon
Materials Research Society Symposium - Proceedings
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Boron-Enhanced-Diffusion of boron: The limiting factor for ultra-shallow junctions
Technical Digest - International Electron Devices Meeting, IEDM
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Thin film resistors and capacitors for advanced packaging
Proceedings of the International Symposium and Exhibition on Advanced Packaging Materials Processes, Properties and Interfaces, pp. 71-74