Publicaciones en colaboración con investigadores/as de Nokia Foundation (6)

2000

  1. Dominant iron gettering mechanism in p/p+ silicon wafers

    Applied Physics Letters, Vol. 77, Núm. 2, pp. 241-243

1999

  1. Atomistic simulations of ion implantation and diffusion

    International Conference on Simulation of Semiconductor Processes and Devices, SISPAD

  2. Boron pileup and clustering in silicon-on-insulator films

    Applied Physics Letters, Vol. 75, Núm. 8, pp. 1083-1085

1997

  1. Atomistic model of transient enhanced diffusion and clustering of boron in silicon

    Materials Research Society Symposium - Proceedings

  2. Boron-Enhanced-Diffusion of boron: The limiting factor for ultra-shallow junctions

    Technical Digest - International Electron Devices Meeting, IEDM

  3. Thin film resistors and capacitors for advanced packaging

    Proceedings of the International Symposium and Exhibition on Advanced Packaging Materials Processes, Properties and Interfaces, pp. 71-74