Publications by the researcher in collaboration with F. Roozeboom (10)


  1. Evolution of fluorine and boron profiles during annealing in crystalline Si

    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 26, Núm. 1, pp. 377-381

  2. F+ implants in crystalline Si: The Si interstitial contribution

    Materials Research Society Symposium Proceedings

  3. Si interstitial contribution of F+ implants in crystalline Si

    Journal of Applied Physics, Vol. 103, Núm. 9


  1. Boron diffusion in amorphous silicon and the role of fluorine

    Applied Physics Letters, Vol. 84, Núm. 21, pp. 4283-4285


  1. Dopant redistribution effects in preamorphized silicon during low temperature annealing

    Technical Digest - International Electron Devices Meeting


  1. Cluster ripening and transient enhanced diffusion in silicon

    Materials Science in Semiconductor Processing, Vol. 2, Núm. 4, pp. 369-376

  2. Energetics of self-interstitial clusters in si

    Physical Review Letters, Vol. 82, Núm. 22, pp. 4460-4463

  3. Ostwald ripening of {113} defects precursors and transient enhanced diffusion

    Materials Research Society Symposium - Proceedings, Vol. 568, pp. 163-168