ETS INGENIEROS TELECOMUNICACION
Center


Lawrence Livermore National Laboratory
Livermore, Estados UnidosPublications in collaboration with researchers from Lawrence Livermore National Laboratory (13)
2003
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Atomistic Monte Carlo simulations of three-dimensional polycrystalline thin films
Journal of Applied Physics, Vol. 94, Núm. 1, pp. 163-168
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Atomistic modeling of amorphization and recrystallization in silicon
Applied Physics Letters, Vol. 82, Núm. 13, pp. 2038-2040
1996
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Atomic scale simulations of arsenic ion implantation and annealing in silicon
Materials Research Society Symposium - Proceedings
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Atomistic calculations of ion implantation in Si: Point defect and transient enhanced diffusion phenomena
Applied Physics Letters, Vol. 68, Núm. 3, pp. 409-411
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Ion beam induced recrystallization of amorphous silicon: A molecular dynamics study
Journal of Applied Physics, Vol. 80, Núm. 11, pp. 6160-6169
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Ion-beam processing of silicon at keV energies: A molecular-dynamics study
Physical Review B - Condensed Matter and Materials Physics, Vol. 54, Núm. 23, pp. 16683-16695
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Molecular dynamics studies of the ion beam induced crystallization in silicon
Materials Research Society Symposium - Proceedings
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Molecular dynamics study of the fluence dependence of Si sputtering by 1 keV Ar+ ions
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 112, Núm. 1-4, pp. 156-159
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Simulations of thin film deposition from atomic and cluster beams
Materials Science and Engineering B, Vol. 37, Núm. 1-3, pp. 1-7
1995
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Atomistic calculations of ion implantation in Si: Point defect and transient enhanced diffusion phenomena
Applied Physics Letters, pp. 409
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Defects from implantation in silicon by linked Marlow-molecular dynamics calculations
Nuclear Inst. and Methods in Physics Research, B, Vol. 102, Núm. 1-4, pp. 180-182
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Diffusion and interactions of point defects in silicon: molecular dynamics simulations
Nuclear Inst. and Methods in Physics Research, B, Vol. 102, Núm. 1-4, pp. 247-255
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Point defect accumulation in silicon irradiated by energetic particles: A molecular dynamics simulation
Nuclear Inst. and Methods in Physics Research, B, Vol. 102, Núm. 1-4, pp. 207-210