Dose effects on amorphous silicon sputtering by argon ions: A molecular dynamics simulation

  1. Marqués, L.A.
  2. Rubio, J.E.
  3. Jaraíz, M.
  4. Bailón, L.A.
  5. Barbolla, J.J.
Revue:
Journal of Applied Physics

ISSN: 0021-8979

Année de publication: 1997

Volumen: 81

Número: 3

Pages: 1488-1494

Type: Article

DOI: 10.1063/1.363914 GOOGLE SCHOLAR