Dopant redistribution effects in preamorphized silicon during low temperature annealing

  1. Venezia, V.C.
  2. Duffy, R.
  3. Pelaz, L.
  4. Aboy, M.
  5. Heringa, A.
  6. Griffin, P.B.
  7. Wang, C.C.
  8. Hopstaken, M.J.P.
  9. Tamminga, Y.
  10. Dao, T.
  11. Pawlak, B.J.
  12. Roozeboom, F.
Proceedings:
Technical Digest - International Electron Devices Meeting

ISSN: 0163-1918

Year of publication: 2003

Pages: 489-492

Type: Conference paper