Dopant redistribution effects in preamorphized silicon during low temperature annealing

  1. Venezia, V.C.
  2. Duffy, R.
  3. Pelaz, L.
  4. Aboy, M.
  5. Heringa, A.
  6. Griffin, P.B.
  7. Wang, C.C.
  8. Hopstaken, M.J.P.
  9. Tamminga, Y.
  10. Dao, T.
  11. Pawlak, B.J.
  12. Roozeboom, F.
Aktak:
Technical Digest - International Electron Devices Meeting

ISSN: 0163-1918

Argitalpen urtea: 2003

Orrialdeak: 489-492

Mota: Biltzar ekarpena