Comparison between the electrical properties of atomic layer deposited thin ZrO2 films processed from cyclopentadienyl precursors

  1. Dueñas, S.
  2. Castán, H.
  3. García, H.
  4. Gómez, A.
  5. Bailón, L.
  6. Kukli, K.
  7. Niinistö, J.
  8. Ritala, M.
  9. Leskelä, M.
Journal:
Microelectronic Engineering

ISSN: 0167-9317

Year of publication: 2009

Volume: 86

Issue: 7-9

Pages: 1689-1691

Type: Article

DOI: 10.1016/J.MEE.2009.03.103 GOOGLE SCHOLAR
Data source: Scopus