Departamento
Electricidad y Electrónica
Publicaciones (37) Publicaciones en las que ha participado algún/a investigador/a
2004
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A 2D-TLM model for electromagnetic wave propagation in Tellegen media
Microwave and Optical Technology Letters, Vol. 40, Núm. 5, pp. 438-441
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A 2D-TLM model for electromagnetic wave propagation in chiral media
IEEE Antennas and Propagation Society, AP-S International Symposium (Digest)
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A kinetic Monte Carlo annealing assessment of the dominant features from ion implant simulations
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
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About the inclusion of eddy currents in micromagnetic computations
Physica B: Condensed Matter
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Advances in time domain numerical modeling for electromagnetic wave propagation in Bi-isotropic media
Fifth International Kharkov Symposium on Physics and Engineering of Microwaves, Millimeter, and Submillimeter Waves - Symposium Proceedings, MSMW'04
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Advances in time domain numerical modeling for electromagnetic wave propagation in bi-isotropic media
MSMW'04: FIFTH INTERNATIONAL KHARKOV SYMPOSIUM ON PHYSICS AND ENGINEERING OF MICROWAVES, MILLIMETER, AND SUBMILLIMETER WAVES, SYMPOSIUM PROCEEDINGS, VOLS 1 AND 2
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An approach to the magnetic disaccommodation in Nd doped yttrium iron garnets
Materials Science Forum
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Atomistic analysis of the ion beam induced defect evolution
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
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Atomistic analysis of the role of silicon interstitials in boron cluster dissolution
Materials Research Society Symposium - Proceedings
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Atomistic modeling and simulation of boron diffusion in crystalline materials : KMC
Journal of the Korean Physical Society
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Atomistic modeling of defect evolution in Si for amorphizing and subamorphizing implants
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
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Atomistic modeling of ion beam induced amorphization in silicon
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
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Atomistic modeling of ion beam induced defects in Si: From point defects to continuous amorphous layers
Materials Research Society Symposium - Proceedings
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Author's reply to remarks on "A 2D TLM model for electromagnetic wave propagation in Tellegen media
Microwave and Optical Technology Letters
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Boron diffusion in amorphous silicon and the role of fluorine
Applied Physics Letters, Vol. 84, Núm. 21, pp. 4283-4285
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Comments on "the far zone scattering calculation of frequency-dependent materials objects using TLM method"
IEEE Transactions on Antennas and Propagation
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Comprehensive, physically based modelling of As in Si
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
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Conductance Transient Comparative Analysis of Electron-Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposited SiNx, SiC 2/SiNx and SiOxNy Dielectric Films on Silicon Substrates
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 43, Núm. 1, pp. 66-70
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Effect of growth temperature and postmetallization annealing on the interface and dielectric quality of atomic layer deposited HfO2 on p and n silicon
Journal of Applied Physics, Vol. 96, Núm. 3, pp. 1365-1372
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FDTD modeling of transient microwave signals in dispersive and lossy bi-isotropic media
IEEE Transactions on Microwave Theory and Techniques, Vol. 52, Núm. 3, pp. 773-784