ETS INGENIEROS TELECOMUNICACION
Center


Universitat Autònoma de Barcelona
Barcelona, EspañaPublications in collaboration with researchers from Universitat Autònoma de Barcelona (18)
2024
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A thorough investigation of the switching dynamics of TiN/Ti/10 nm-HfO2/W resistive memories
Materials Science in Semiconductor Processing, Vol. 169
2023
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Effects of the voltage ramp rate on the conduction characteristics of HfO2-based resistive switching devices
Journal of Physics D: Applied Physics, Vol. 56, Núm. 36
2022
2021
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Clinical characteristics and 3-month outcomes in cancer patients with incidental versus clinically suspected and confirmed pulmonary embolism
European Respiratory Journal, Vol. 58, Núm. 1
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Fabrication, characterization and modeling of TiN/Ti/HfO2/W memristors: Programming based on an external capacitor discharge
Proceedings of the 2021 13th Spanish Conference on Electron Devices, CDE 2021
2019
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The prognostic value of blood pressure control delay in newly diagnosed hypertensive patients
Journal of Hypertension, Vol. 37, Núm. 2, pp. 426-431
2018
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Analysis and control of the intermediate memory states of RRAM devices by means of admittance parameters
Journal of Applied Physics, Vol. 124, Núm. 15
2017
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Digital tools for capturing user’s needs on urban open spaces: drawing lessons from cyberparks project
Springer Tracts in Civil Engineering (Springer), pp. 177-193
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Experimental observation of negative susceptance in HfO2-based RRAM devices
IEEE Electron Device Letters, Vol. 38, Núm. 9, pp. 1216-1219
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Study of the admittance hysteresis cycles in TiN/Ti/HfO2/W-based RRAM devices
Microelectronic Engineering, Vol. 178, pp. 30-33
2016
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Electrical properties and nanoresistive switching of Ni-HfO2-Si capacitors
ECS Transactions
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Study from cryogenic to high temperatures of the high- and low-resistance-state currents of ReRAM Ni-HfO2-Si capacitors
IEEE Transactions on Electron Devices, Vol. 63, Núm. 5, pp. 1877-1883
2015
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Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition
Thin Solid Films, Vol. 591, pp. 55-59
2014
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Single-parameter model for the post-breakdown conduction characteristics of HoTiOx-based MIM capacitors
Microelectronics Reliability
2011
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Electrical characterization of high-k based metal-insulator-semiconductor structures with negative resistance effect when using Al2O 3 and nanolaminated films deposited on p-Si
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
2007
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Study of the EEG changes during the combined ingestion of alcohol and H1-antihistamines by using the wavelet transform
Annual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings
1995
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Ability of capacitance–voltage transient technique to study spatial distribution and electric field dependence of emission properties of deep levels in semiconductors
Materials Science and Technology (United Kingdom), Vol. 11, Núm. 10, pp. 1074-1078
1993
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Electrical characterization of MOS structures fabricated on SF6 and SF6 + C2CIF5 reactive ion etched silicon
Nuclear Inst. and Methods in Physics Research, B, Vol. 80-81, Núm. PART 2, pp. 1362-1366