Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

  1. Dueñas, S.
  2. Castán, H.
  3. García, H.
  4. Barbolla, J.
  5. Kukli, K.
  6. Aarik, J.
  7. Ritala, M.
  8. Leskelä, M.
Journal:
Microelectronics Reliability

ISSN: 0026-2714

Year of publication: 2005

Volume: 45

Issue: 5-6

Pages: 949-952

Type: Conference paper

DOI: 10.1016/J.MICROREL.2004.11.052 GOOGLE SCHOLAR
Data source: Scopus