Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition

  1. Dueñas, S.
  2. Castán, H.
  3. García, H.
  4. Barbolla, J.
  5. Kukli, K.
  6. Aarik, J.
  7. Ritala, M.
  8. Leskelä, M.
Revue:
Microelectronics Reliability

ISSN: 0026-2714

Année de publication: 2005

Volumen: 45

Número: 5-6

Pages: 949-952

Type: Communication dans un congrès

DOI: 10.1016/J.MICROREL.2004.11.052 GOOGLE SCHOLAR
La source de données: Scopus