Publications in collaboration with researchers from University of Tartu (42)


  1. Inhomogeneous HfO2layer growth at atomic layer deposition

    Journal of Electrical Engineering, Vol. 74, Núm. 4, pp. 246-255


  1. Admittance memory cycles of Ta2O5-ZrO2-based RRAM devices

    2017 32nd Conference on Design of Circuits and Integrated Systems, DCIS 2017 - Proceedings

  2. Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

    Beilstein Journal of Nanotechnology, Vol. 9, Núm. 1, pp. 119-128

  3. The Role of Defects in the Resistive Switching Behavior of Ta2O5-TiO2-Based Metal–Insulator–Metal (MIM) Devices for Memory Applications

    Journal of Electronic Materials


  1. Electrical characterization of high-k based MIS capacitors using flat-band voltage transients

    Proceedings of the 2009 Spanish Conference on Electron Devices, CDE'09