ALFONSO
GOMEZ BRAVO
PROFESOR CONTRATADO DOCTOR
![Foto de M.](/img/nophoto.png)
M.
Leskelä
M. Leskelä-rekin lankidetzan egindako argitalpenak (11)
2011
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Characterization of SrTiO3-based MIM capacitors grown by using different precursors and growth temperatures
Proceedings of the 8th Spanish Conference on Electron Devices, CDE'2011
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Influence of precursor chemistry and growth temperature on the electrical properties of SrTiO3 -based metal-insulator-metal capacitors grown by atomic layer deposition
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
2009
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Comparison between the electrical properties of atomic layer deposited thin ZrO2 films processed from cyclopentadienyl precursors
Microelectronic Engineering, Vol. 86, Núm. 7-9, pp. 1689-1691
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Electrical characterization of ZrO2-based MIS structures with highly doped Si substrates
Proceedings of the 2009 Spanish Conference on Electron Devices, CDE'09
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Electrical characterization of high-k based MIS capacitors using flat-band voltage transients
Proceedings of the 2009 Spanish Conference on Electron Devices, CDE'09
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Electrical properties of thin zirconium and hafnium oxide high-k gate dielectrics grown by atomic layer deposition from cyclopentadienyl and ozone precursors
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 27, Núm. 1, pp. 389-393
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Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectrics
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 27, Núm. 1, pp. 416-420
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Study of atomic layer deposited zirconium oxide thin films by using mono-cyclopentadienyl based precursors
Proceedings of the 2009 Spanish Conference on Electron Devices, CDE'09
2008
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Comparative study of flatband voltage transients on high-k dielectric-based metal-insulator-semiconductor capacitors
Journal of the Electrochemical Society, Vol. 155, Núm. 11
2007
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Electrical properties of atomic-layer-deposited thin gadolinium oxide high- k gate dielectrics
Journal of the Electrochemical Society, Vol. 154, Núm. 10
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Study of atomic layer deposited gadolinium oxide thin films on silicon
Materials Research Society Symposium Proceedings