PROYECTOS NACIONALES
Project PB95-0710
SIMULACION Y CARACTERIZACION DE LA IMPLANTACION IONICA EN SEMICONDUCTORES.
date_range
Duration: from 01 November 1996 to 01 November 1999
(36 months)
euro
152,056.06 EUR
Of National scope. With a Public character.
Researchers
JUAN JOSE
BARBOLLA SANCHO
Leader
Publications related to the project
Show by type1999
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Electrical characterization of He-ion implantation-induced deep levels in p+n InP junctions
Journal of Applied Physics
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Electrical characterization of a He ion implantation-induced deep level existing in p+n InP junctions
Journal of Applied Physics