Publicaciones en colaboración con investigadores/as de University of Helsinki (63)

2018

  1. Atomic layer deposition and properties of HFO 2 -Al 2 O 3 nanolaminates

    ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 9, pp. P501-P508

  2. Electric and magnetic properties of atomic layer deposited ZrO 2 -HfO 2 thin films

    ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 9, pp. N117-N122

  3. Admittance memory cycles of Ta2O5-ZrO2-based RRAM devices

    2017 32nd Conference on Design of Circuits and Integrated Systems, DCIS 2017 - Proceedings

  4. Atomic layer deposition and performance of ZrO2-Al2O3 thin films

    ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 5, pp. P287-P294

  5. Atomic layer deposition and properties of ZrO2/Fe2O3 thin films

    Beilstein Journal of Nanotechnology, Vol. 9, Núm. 1, pp. 119-128

  6. Atomic layer deposition of zirconium dioxide from zirconium tetraiodide and ozone

    ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 2, pp. P1-P8

  7. Memory maps: Reading RRAM devices without power consumption

    ECS Transactions

  8. Properties of atomic layer deposited nanolaminates of zirconium and cobalt oxides

    ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 8, pp. P402-P409