FAC CIENCIAS
Centro
University of Helsinki
Helsinki, FinlandiaPublicaciones en colaboración con investigadores/as de University of Helsinki (63)
2023
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Euclid preparation: XXV. the Euclid Morphology Challenge: Towards model-fitting photometry for billions of galaxies
Astronomy and Astrophysics, Vol. 671
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Euclid preparation: XXVI. the Euclid Morphology Challenge: Towards structural parameters for billions of galaxies
Astronomy and Astrophysics, Vol. 671
2022
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Euclid preparation: XVI. Exploring the ultra-low surface brightness Universe with Euclid /VIS
Astronomy and Astrophysics, Vol. 657
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Improved ocular delivery of quercetin and resveratrol: A comparative study between binary and ternary cyclodextrin complexes
International Journal of Pharmaceutics, Vol. 624
2021
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Analysis of the performance of Nb2O5-doped SiO2-based MIM devices for memory and neural computation applications
Solid-State Electronics, Vol. 186
2020
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Bioprocessing of Brewers’ Spent Grain Enhances Its Antioxidant Activity: Characterization of Phenolic Compounds and Bioactive Peptides
Frontiers in Microbiology, Vol. 11
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Double Swing Quiescent-Current: An Experimental Detection Method of Ferroelectricity in Very Leaky Dielectric Films
ECS Transactions
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Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 38, Núm. 4
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New particle formation at urban and high-altitude remote sites in the south-eastern Iberian Peninsula
Atmospheric Chemistry and Physics, Vol. 20, Núm. 22, pp. 14253-14271
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Silicon oxide-niobium oxide mixture films and nanolaminates grown by atomic layer deposition from niobium pentaethoxide and hexakis(ethylamino) disilane
Nanotechnology, Vol. 31, Núm. 19
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TRY plant trait database – enhanced coverage and open access
Global Change Biology, Vol. 26, Núm. 1, pp. 119-188
2019
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Electrical and magnetic properties of atomic layer deposited cobalt oxide and zirconium oxide nanolaminates
Thin Solid Films, Vol. 669, pp. 294-300
2018
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Atomic layer deposition and properties of HFO 2 -Al 2 O 3 nanolaminates
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 9, pp. P501-P508
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Electric and magnetic properties of atomic layer deposited ZrO 2 -HfO 2 thin films
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 9, pp. N117-N122
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Admittance memory cycles of Ta2O5-ZrO2-based RRAM devices
2017 32nd Conference on Design of Circuits and Integrated Systems, DCIS 2017 - Proceedings
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Atomic layer deposition and performance of ZrO2-Al2O3 thin films
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 5, pp. P287-P294
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Atomic layer deposition and properties of ZrO2/Fe2O3 thin films
Beilstein Journal of Nanotechnology, Vol. 9, Núm. 1, pp. 119-128
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Atomic layer deposition of zirconium dioxide from zirconium tetraiodide and ozone
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 2, pp. P1-P8
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Memory maps: Reading RRAM devices without power consumption
ECS Transactions
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Properties of atomic layer deposited nanolaminates of zirconium and cobalt oxides
ECS Journal of Solid State Science and Technology, Vol. 7, Núm. 8, pp. P402-P409