JUAN IGNACIO
JIMENEZ LOPEZ
PROFESOR EMERITO
Centre National de la Recherche Scientifique
París, FranciaPublicaciones en colaboración con investigadores/as de Centre National de la Recherche Scientifique (16)
2022
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Luminescence in undoped and Nb-doped SrTiO3 crystals: Bulk and surface emission
Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 283
2021
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Low temperature micro-photoluminescence spectroscopy of microstructures with InAsP/InP strained quantum wells
Journal of Physics D: Applied Physics, Vol. 54, Núm. 44
2020
2018
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Mapping of mechanical strain induced by thin and narrow dielectric stripes on InP surfaces
Optics Letters, Vol. 43, Núm. 15, pp. 3505-3508
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Mechanical Stress in InP Structures Etched in an Inductively Coupled Plasma Reactor with Ar/Cl2/CH4 Plasma Chemistry
Journal of Electronic Materials
2016
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Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 34, Núm. 4
2015
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Evidence of chlorine ion penetration in InP/InAsP quantum well structures during dry etching processes and effects of induced-defects on the electronic and structural behaviour
Microelectronics Reliability, Vol. 55, Núm. 9-10, pp. 1750-1753
2003
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Study of doping in GaAs layers by local probe techniques: Micro-Raman, micro-photoluminescence and cathodoluminescence
Materials Research Society Symposium - Proceedings
2002
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Doping profiles of n-type GaAs layers grown on Si by the conformal method
Materials Research Society Symposium - Proceedings, Vol. 692, pp. 417-422
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Optical characterization of GaAs/Si layers grown by the conformal method (confined lateral epitaxial growth)
Journal of Materials Research, Vol. 17, Núm. 6, pp. 1341-1349
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Study of defects in conformal GaAs/Si layers by optical techniques and photoetching
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
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Temperature dependence of the Raman shift in GaAs conformal layers grown by hydride vapor phase epitaxy
Journal of Applied Physics, Vol. 91, Núm. 8, pp. 5045-5050
2001
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High-quality GaAs-related lateral junctions on Si by conformal growth
Optical Materials
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Selective doping of conformal GaAs layers grown by hydride vapour phase epitaxy on Si substrates studied by spatially resolved optical techniques
Materials Science and Engineering B: Solid-State Materials for Advanced Technology, Vol. 80, Núm. 1-3, pp. 197-201
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Self-doping near the seed/layer interface in conformal GaAs layers grown on Si
Applied Physics Letters, Vol. 79, Núm. 9, pp. 1270-1272
2000
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Characterization of GaAs conformal layers grown by hydride vapour phase epitaxy on Si substrates by microphotoluminescence cathodoluminescence and microRaman
Journal of Crystal Growth, Vol. 210, Núm. 1, pp. 198-202